Enhanced mechanical properties of HfO₂ film by nitrogen doping

Abstract

The chemical composition, structure and mechanical properties of hafnium oxide films with different nitrogen constituents were investigated. X-ray photoelectron spectrum analysis showed that nitrogen atoms acted as oxygen substitution and interstitial atoms. The crystalline features exhibited no change during nitrogen doping. Nevertheless, the films with high compressive stress displayed significantly enhanced mechanical properties. The enhanced mechanism could mainly be attributed to the dislocation obstacle motion by inserting nitrogen atoms.

Keywords:

• Hafnium oxynitride film
• Magnetron sputtering
• Stress
• Nitrogen doping
• Hardness

Acknowledgements

This work was supported by National Natural Science Excellent Young Foundation of China (Grant No. 51222205) and the National Natural Science Foundation of China (Grant No. 51372053).