ABSTRACT
Electron beam physical vapour deposition is a reliable technique used to deposit coatings with desired microstructures; however, controlling the chemical composition of the alloy coatings is not simple and several features should be considered. The aim of this paper is to summarise and establish the connection between the important work that has been done in this area to achieve a homogeneous and controlled chemical composition in the deposited film. Technical and fundamental aspects are discussed.
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Disclosure statement
No potential conflict of interest was reported by the authors.