Decomposition of 2‐deoxy‐D‐ribose by irradiation with 0.6 keV electrons and by 0.5 keV ultrasoft X‐rays

Abstract

Purpose: To compare the molecular decomposition of 2‐deoxy‐D‐ribose induced by 0.6 keV electron irradiation or by 0.5 keV ultrasoft X‐ray irradiation.

Materials and methods: A thin film of 2‐deoxy‐D‐ribose was irradiated by two radiation sources: low‐energy (∼0.6 keV) electrons and ultrasoft X‐rays (∼0.5 keV). The positive ions that were desorbed from the sample during the irradiation were measured using a quadrupole mass spectrometer. The spectral changes in the X‐ray absorption near edge structure (XANES) were also examined after the irradiation.

Results and discussion: The ions that were desorbed from 2‐deoxy‐D‐ribose due to electron irradiation were mainly H⁺, CH_x⁺, C₂H_x⁺, CO⁺, CH_xO⁺, C₃H_x⁺, C₂H_xO⁺ and C₃H_xO⁺ (x=1, 2, and 3) ions. These ions were the same as those observed in desorption due to ultrasoft X‐ray irradiation. The XANES spectral changes induced by electron irradiation showed C‐O bond cleavage in the molecule and C=O bond formation in the surface residues. These results show that intensive molecular decomposition of the furanose ring structure was induced by both types of irradiation. It is inferred that these irradiation products are primarily produced by secondary electrons (several tens of eV), which are thought to be generated by both types of irradiation when they are applied to the 2‐deoxy‐D‐ribose sample.