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Radiation Effects and Defects in Solids
Incorporating Plasma Science and Plasma Technology
Volume 108, 1989 - Issue 2-4
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Original Articles

Electronic effects in MeV ion tracks affecting thin film adhesion

P. Anders Ingemarsson Dept. of Radiation Sciences, Uppsala University, Box 535, S-751 21, Uppsala, Sweden
,
Allan Hedin Dept. of Radiation Sciences, Uppsala University, Box 535, S-751 21, Uppsala, Sweden
,
Bo U. R. Sundqvist Dept. of Radiation Sciences, Uppsala University, Box 535, S-751 21, Uppsala, Sweden
,
Thomas A. Tombrello Schlumberger-Doll Research, Old Quarry Road, Ridgefield, CT, 06877-4108, U.S.A.
&
Robert E. Johnson Dept. of Nuclear Engineering and Engineering Physics, University of Virginia, Charlottesville, VA, 22901, U.S.A.
Pages 205-209 | Received 16 Nov 1988, Published online: 19 Aug 2006
 
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Abstract

An ion track model was applied to describe MeV ion induced adhesion improvement of Au thin films on amorphous SiO2. Good agreement with experimental data was found when assuming that ion track energy densities above and below a certain interval do not contribute to the adhesion enhancement; damage effects detrimental to adhesion may be associated with the high energy densities in the vicinity of the ion path.

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