Generating Silicon Nanoparticles Using Spark Erosion by Flushing High-Pressure Deionized Water

Abstract

Nanoparticles (NPs) are typically materials with dimensions less than 100 nm. In this work, silicon nanoparticles (SiNPs) were produced by electrical discharge machining of boron doped Si ingot (resistivity 0.01 Ω cm⁻¹). The “top-down” process used in this work involved vaporizing bulk Si material with spark erosion and rapidly cooling the vapors in the presence of deionized water at high-pressure of up to 0.8 MPa, to produce nanosized spheres. The microtopology and element composition analysis of the SiNPs were done by using scanning electron microscopy/energy-dispersive spectroscopy. It was observed that processing under high-pressure flushing conditions ensured production of SiNPs with average diameter of 30 ∼ 50 nm and productivity of 1.5 g h⁻¹. SiNPs generated were spherical in shape due to the rapid solidification and surface tension. The structure of SiNPs was found to remain crystalline, according to the X-ray diffraction profiles. Transmission electron microscopy verified identical morphology and size for the SiNPs. The results demonstrate great potential for this process to be an industrialized SiNPs preparation method in terms of both particle size and productivity.

Keywords:

• Crystalline
• Deionized-water (DW)
• Erosion
• Flushing
• Nanoparticle
• Silicon
• Spark