Optimizing FIB milling process parameters for silicon and its use in nanoreplication

ABSTRACT

FIB process parameters such as beam current, dwell time, and percentage overlap are optimized for the FIB milling of single crystal materials. Multiobjective optimization was carried out using Genetic Algorithm to maximize the material removal rate as well as to simultaneously minimize the surface roughness of the milled cavities. The optimized process parameters were used to make moulds that were further used for nanoreplication.

KEYWORDS:

• Focused ion beam
• genetic algorithm
• atomic force microscopy
• nanomoulding