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Abstract
Pb(Zr,Ti)O3 (PZT) films grown on Ir electrodes by a metal-organic chemical vapor deposition (MOCVD) have suffered from high leakage and rough surface. We sputtered Pt and Ir simultaneously onto Ti/SiO2/Si substrates and formed Ir-Pt alloy bottom electrodes with various compositions. With an optimal composition of Ir and Pt, PZT films grown by MOCVD on this substrate showed smoother surface and suppressed leakage via the bottom interface. At the specific composition of Ir and Pt, two different phases seemed to be acquired. They constituted the electrodes and affected the PZT grain nucleation independently so that the grains with different origins grew and restrained the vicinal grains, and finally soothed the faceted-grain-formation. No fatigue was observed even in PZT on Ir-Pt alloy with much Pt content.