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Integrated Ferroelectrics
An International Journal
Volume 95, 2007 - Issue 1
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SESSION G: INTEGRATED HYBRID MATERIALS AND LIQUID CRYSTALS

INFLUENCE OF THE POLING PROCESS ON THE PYROELECTRIC COEFFICIENT OF A 70/30MOL % P(VDF-TRFE) THIN FILM

C. VACHER e2v Semiconductors (ex-ATMEL) - Avenue de Rochepleine BP123, F-38521, Saint Egréve Cedex
,
V. BORNAND ICGM UMR 5253- PMOF CC1504 - UM II, Place E. Bataillon, F-34095, Montpellier Cedex 5
,
A. COLLET ICGM UMR 5253 - IAM ESOM CC1702 - UM II, Place E. Bataillon, F-34095, Montpellier Cedex 5
,
L. FRITSCH e2v Semiconductors (ex-ATMEL) - Avenue de Rochepleine BP123, F-38521, Saint Egréve Cedex
&
PH. PAPET ICGM UMR 5253- PMOF CC1504 - UM II, Place E. Bataillon, F-34095, Montpellier Cedex 5
Pages 171-179 | Received 15 Jun 2007, Accepted 30 Sep 2007, Published online: 20 Sep 2010
 
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ABSTRACT

A poling process of a P(VDF-TrFE) thin film with a 70/30mol % composition is described in this work. Different parameters are studied such as the intensity of the poling field, its dwell time, or the number of voltage step during a ramp to reach the maximum field applied. The poling field appears as the most important parameter influencing the performances of the pyroelectric coefficient. However the integration of steps during a ramp to the maximum field generates a slight decrease of this coefficient.

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