LIQUID SOURCE MISTED CHEMICAL DEPOSITION PROCESS OF THREE-DIMENSIONAL NANO-FERROELECTRICS WITH SUBSTRATE HEATING

ABSTRACT

A modification of liquid source misted chemical deposition process (LSMCD) with heating mist and substrate has developed, and this enabled to control mist penetrability and fluidity on sidewalls of three-dimensional structures and ensure step coverage. A modified LSMCD process allowed a combinatorial approach of Pb(Zr,Ti)O₃ (PZT) thin films and carbon nanotubes (CNTs) toward ultrahigh integration density of ferroelectric random access memories (FeRAMs). The CNTs templates were survived during the crystallization process of deposited PZT film onto CNTs annealed at 650°C in oxygen ambient due to a matter of minute process, so that the thermal budget is quite small. The modified LSMCD process opens up the possibility to realize the nanoscale capacitor structure of ferroelectric PZT film with CNTs electrodes toward ultrahigh integration density FeRAMs.

keywords:

• Liquid Source Misted Chemical Deposition
• Pb(Zr,Ti)O₃
• Carbon nanotubes
• wetting
• micropores

ACKNOWLEDGMENT

We thank Kojundo Chemical Laboratory Co., Ltd. for preparing the PZT liquid source precursor.