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Integrated Ferroelectrics
An International Journal
Volume 95, 2007 - Issue 1
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SESSION I: MULTIFERROIC/MAGNETOELECTRIC FILMS

STRESS DEPENDENCE OF FERROELECTRIC AND MAGNETOELECTRIC PROPERTIES OF BiFeO3 THIN FILMS ON MEMBRANE STRUCTURE

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Pages 217-225 | Received 15 Jun 2007, Accepted 30 Sep 2007, Published online: 20 Sep 2010
 

ABSTRACT

Multiferroic 350-nm-thick BiFeO3 thin films have been prepared on Pt/TiO2/SiO2/ Si(54 μm) membrane substrates by pulsed laser deposition. To confirm the influence of stress from substrate, ferroelectric and magnetoelectric properties of BiFeO3 thin films have been evaluated with applying stress. For applying stress, we tried to pump out backside of the membrane structure at various pressures. From ferroelectric hysteresis loops, the remanent polarization at the pumping pressure of 0.01 atm increase from 105 to 110 μC/cm2, comparing to that without pumping. Under magnetic field of 0.4 T, polarization at zero electric field at pumping pressure of 0.01 atm with maximum applied voltage of 15 V increased from 100 μC/cm2 to 103 μC/cm2.

ACKNOWLEDGMENTS

The authors would like to thank Dr. K. Yamashita and Dr. M. Sohgawa of Osaka University for his help in fabrication of the membrane structure. This study was supported by the Kato Foundation for Promotion of Science.

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