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Integrated Ferroelectrics
An International Journal
Volume 97, 2008 - Issue 1
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SESSION D2: HIGH-K DIELECTRICS AND ELECTRODES

PERFORMANCE OF THIN FILM FERROELECTRICS WITH DOPANT-ION CHARGES

, &
Pages 69-83 | Received 15 Jun 2007, Accepted 16 Oct 2007, Published online: 20 Sep 2010
 

ABSTRACT

This paper studied the effect of dopant-ion charges on the performance of thin film ferroelectrics. Field distributions and capacitance of ferroelectric thin films with different dopant-ion charge densities are analyzed. The non-linearity of the electric field inside the thin film increases with the dopant-ion charge density and decreases with the linear permittivity of the ferroelectric thin film. Once the applied voltage is strong enough, the field distribution will become linear. The FE thin film peak capacitance reduces with the dopant-ion charge density and the total area under the C-V curve between two large voltages with opposite signs is fixed.

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