ABSTRACT
In this work, we investigate the deposition of crystallization-promoting amorphous titania seed layers onto Cu-coated Kapton® HN foils for a subsequent PZT thin film fabrication thereon. Ultrathin TiO2-x layers with controlled stoichiometry were deposited by reactive sputtering at low substrate temperatures. X-ray photoelectron spectroscopy revealed that the Ti4+ ion in the seed layer was stable against Ar+ bombardment-induced reduction while CuO was reduced to Cu2O. Adsorbed moisture, organic solvents and carbon contaminations were quickly removed by Ar+ ion bombardment. (111)-textured PZT was fabricated on seed-layer-coated flexible substrates by means of a RF-modulated plasma jet system.
ACKNOWLEDGMENTS
This work was supported by the German Research Council (DFG), Grant GE 779/18 and by the Academy of Science of the Czech Republic, Grant KJB100100703, Grants 202/09/J017 and AV0Z10100522.