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Integrated Ferroelectrics
An International Journal
Volume 129, 2011 - Issue 1
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Original Articles

Elastoplastic Indentation Responses of Nanoporous Film/Substrate System

Fue Han School of Aerospace, Xi’an Jiaotong University, Xi’an, 710049, P. R. China; School of Science, Xi’an Polytechnic University, Xi’an, 710048, P. R. China
,
Changqing Chen School of Aerospace, AML, Tsinghua University, Beijing, 100084, P.R. China
&
Yapeng Shen School of Aerospace, Xi’an Jiaotong University, Xi’an, 710049, P. R. China
Pages 85-94 | Received 09 Aug 2010, Accepted 23 Aug 2010, Published online: 17 Oct 2011
 
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Abstract

The elastoplastic indentation responses of a nanoporous film/substrate system to rigid sphere and circular cylindrical punch indenters are simulated by the finite element method. The porous film contains voids in the nanometer scale and arranged in the hexagonal manner. Determination of the macroscopic elastic-plastic properties of the film (i.e., the transverse isotropic indentation modulus, hardness, and yielding stress) using the indentation responses is explored. Obtained results show that the amethods.

Acknowledgment

The authors are grateful for the financial support of this work by the National Natural Science Foundation of China (90205030, 10425210, and 10832002), the National Basic Research Program of China (2006CB601202), and the National High Technology Research and Development Program of China (2006AA03Z519).

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