Abstract
Post-cleavable block copolymer is a very important class of materials, especially for the preparation of nanochannel materials. Block copolymers can self-assemble to various nanostructures. By adding specific groups between two blocks, we can obtain the materials we need. Here, we synthesized a block copolymer with acid-cleavable junction. Polyethylene oxide and polymethyl methacrylate with chalcone structure (PEO-Ac-PChal)were synthesized by atom transfer radical polymerization (ATRP). After the acetal structure is acidified, one of the blocks was dissolved by a specific solvent, and the nanochannel structure was prepared.