Abstract
Dielectric relaxation has been observed for a wide variety of materials. Specifically for dielectric thin films, a typical Curie - von Schweidler relaxation has been reported by many groups in the literature. Although some possible reasons for these relaxation phenomena have been discussed, a comprehensive understanding of the physical origins for all of these materials has not be obtained. Summarizing, not only our results, we present a physical model, which consistently explains the origin of the Curie-von Schweidler behavior for the wide variety of investigated thin film materials.