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Integrated Ferroelectrics
An International Journal
Volume 22, 1998 - Issue 1-4
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Session 7. Testing and characterization

Curie - Von Schweidler behaviour observed in ferroelectric thin films and comparison to superparaelectric thin film materials

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Pages 109-121 | Received 03 Apr 1998, Published online: 19 Aug 2006
 

Abstract

Dielectric relaxation has been observed for a wide variety of materials. Specifically for dielectric thin films, a typical Curie - von Schweidler relaxation has been reported by many groups in the literature. Although some possible reasons for these relaxation phenomena have been discussed, a comprehensive understanding of the physical origins for all of these materials has not be obtained. Summarizing, not only our results, we present a physical model, which consistently explains the origin of the Curie-von Schweidler behavior for the wide variety of investigated thin film materials.

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