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Journal of Macromolecular Science, Part A
Pure and Applied Chemistry
Volume 45, 2008 - Issue 11
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Original Articles

Patterning Flexible Substrates Using Surface Relief Structures in Azobenzene Functionalized Polymer Films

Suizhou Yang Center for Advanced Materials, University of Massachusetts, Lowell, MA, 01854 Phone: 978-934-3695 Fax: 978-934-3695
,
Ke Yang Center for Advanced Materials, University of Massachusetts, Lowell, MA, 01854 Phone: 978-934-3707 Fax: 978-934-3707
,
Aloke Jain Center for Advanced Materials, University of Massachusetts, Lowell, MA, 01854 Phone: 978-934-3707 Fax: 978-934-3707
,
Ramaswamy Nagarajan Department of Plastics Engineering, University of Massachusetts, Lowell, MA, 01854 Phone: 978-934-3454 Fax: 978-934-3454
&
Jayant Kumar Department of Physics and Applied Physics, University of Massachusetts, Lowell, MA, 01854 Phone: 978-934-3687 Fax: 978-934-3687
Pages 938-941 | Published online: 19 Nov 2008
 
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Abstract

A novel method for maskless micro-patterning of polymeric substrates is presented. First, an azobenzene functionalized polymer film is spin-coated on a Poly (ethylene terephthalate) (PET) sheet. Then surface relief structures are optically inscribed on the polymer film by interference of laser beams. The patterned azobenzene functionalized film is then etched in the plasma chamber such that the gratings are transferred to the PET substrate. Finally, any remaining azobenzene functionalized polymer is dissolved away using an appropriate solvent. This method of patterning can be broadly applied to a variety of flexible/polymeric substrates and the resolution is not limited by the substrate thermo-mechanical properties.

Acknowledgement

The authors thank the National Science Foundation, ECS-0601602 and DMR0075170 for the financial support of this work.

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