Abstract
A novel, one step and simple methodology for the fabrication of submicron scale silver patterns is demonstrated. The photosensitivity of an organic silver salt has been utilized for this purpose of fabrication. The silver-organometallic compound is converted to metallic silver selectively in the illuminated regions. Surface morphology was studied by scanning electron microscopy (SEM). Energy dispersion spectroscopy (EDS) shows the presence of silver in the developed film. X-ray photoelectron spectroscopy (XPS) confirms the formation of metallic silver. Feature sizes of the order of 200 nm have been achieved using this technique.
Acknowledgement
We thank Mr. John Pennace from FLEXcon Inc for valuable discussion. This study was supported by National Science Foundation (NSF ECS 0601602).