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Original Articles

Photoadmittance in amorphous-silicon Schottky diodes

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Pages 19-36 | Received 08 Mar 1985, Accepted 28 Mar 1986, Published online: 27 Sep 2006
 

Abstract

The steady-state photoadmittance Yph(= Gph + iωCph) of the depletion region in an amorphous-silicon Schottky diode has been measured for different frequencies, temperatures, illuminations and bias levels. A model for the temperature dependence of the space-charge photoadmittance in the depletion region is given; the loss contribution due to the transport of photo-generated holes across the depletion region is also considered. Experimental results for a Pt-a-Si: H diode are given and it is suggested that there is a one-to-one correspondence between the detail of G ph as a function of temperature and the distribution of the gap-state density N(E) with energy. It is concluded that there is a peak in N(E) at 0·3–0·4 eV above E v having an integrated density of 4 × 10l5 cm−3.

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