Edge misfit dislocation formation at the interface of a nanopore and infinite substrate with surface/interface effects

Abstract

The model of an edge misfit dislocation at the interface of the hollow nanopore and the infinite substrate with surface/interface stress is investigated. Using the complex variable method, analytical solutions for complex potentials of a film due to an edge misfit dislocation located in the film with surface/interface effect are derived, and the stress fields of the film and the edge misfit dislocation formation energy can be obtained. The critical conditions for edge misfit dislocation formation are given at which the generation of an edge misfit dislocation is energetically favourable. The influence of the ratio of the shear modulus between the film and the infinite substrate, the misfit strain, the radius of the nanopore and the surface/interface stress on the critical thickness of the film is discussed.

Keywords:

• nanopore
• critical film thickness
• surface/interface stress

Acknowledgements

The authors appreciate support from the NNSFC (11172094, and 11172095) and the NCET-11-0122. The work was also supported by the Fundamental Research Funds for the Central Universities, Hunan University.