Nanostructures Fabrication on Ta Thin Film Using Atomic Force Microscope Lithography

ABSTRACT

Atomic force microscope (AFM) lithography based on localized current injection was carried out for fabricating nanostructures of metal oxide on tantalum (Ta). Fabricated nanopatterns of tantalum oxide (Ta₂O₅) were selectively etched by magnetically enhanced inductively coupled plasma (MEICP) etching system. Nanopatterns of Ta with feature size in the range of a few tens-hundreds nm were successfully fabricated.

Keywords:

• atomic force microscope (AFM) lithography
• etching
• nanopattern
• Ta

Acknowledgments

This work was supported by the National Program for Tera-Level Nanodevices of the Ministry of Science and Technology as one of the 21st century Frontier Programs.