Submicron Channel Fabrication in Photoresist Film Using Continuous Wave Laser

Abstract

Laser fabrication of submicron hollow channel using a continuous wave (CW) light source is investigated. In conventional laser fabrication, CW laser beam affects the immediate vicinity of a beam exposure area because the fabrication employs a heat mode process. Our method proposed, however, three-dimensionally localizes the exposure area in a focal plane by controlling the reaction time constant of a photoresist film. As a result, we have fabricated a submicron hollow channel in the photoresist film using the CW laser source.

Keywords:

• CW laser
• laser fabrication
• nonlinear optics
• photoresist
• reaction time constant