Study on Fabrication Conditions of Polymer-Stabilized V-Mode FLCD

Abstract

In this research, we focus on the polymer-stabilized V-mode FLC (PSV-FLC) in which a doped monomer is photocured in the SmA phase. PSV-FLC may show monostable and V-shaped electrooptical characteristics with a grayscale capability. In this paper, we investigate the dependence of the monostable capability on the fabricating conditions such as monomer materials, polymer concentration, and UV energy. Furthermore, in order to increase the contrast ratio, we introduce a photo-alignment technique. As a result, it is found that the monostable capability of PSV-FLC strongly depends on their conditions. Furthermore, the more uniform molecular alignment without rubbing scratch pattern was obtained by using the photo-alignment film.

Keywords:

• Ferroelectric liquid crystal
• polymer stabilization
• photocure
• monostability
• memory angle
• photo-alignment

Acknowledgments

The authors thank Dr. H. Takatsu, Dr. H. Hasebe, Dr. K. Maruyama, and Dr. I. Nishiyama of DIC for supplying FLC and photocurable mesogenic materials. We also thank Dr. H. Fukuro and Mr. H. Endoh of Nissan Chem. Ind. for supplying polyimide materials. This research was partially supported by the Shinsei Fundation.