ABSTRACT
Chronic wounds have affected more than 6 million people, especially diabetic populations. Various antimicrobial substances have been added to nanocellulose-based wound dressing to inhibit microbial growth. However, the substances triggered multiple adverse implications on humans. In this communication, we have developed a ferulic acid-grafted cellulose nanocrystal film as a potential antimicrobial material for wound dressing development. Needle-like cellulose nanocrystals, with an average length of 159 ± 31 nm, were extracted from medical-grade cotton using the acid hydrolysis method. A combination of cellulose nanocrystals, polyvinyl alcohol (PVA) and ferulic acid has generated a soft, sturdy, flexible, elastic and non-ductile film. It absorbed a large amount of exudates by presenting a swelling ratio of 774 ± 57%. The release of ferulic acid achieved a plateau at 20 h, with a total release of 75.4 ± 7.9% from the developed film. The ferulic acid-grafted cellulose nanocrystal film inhibited the growth of 2 Gram-positive bacteria, 3 Gram-negative bacteria and 1 yeast. During the Hohenstein challenge and wash durability, the developed film retained its antimicrobial efficiency by reducing up to 82% microbial growth even after 20 washes. The findings exposed that the ferulic acid-grafted cellulose nanocrystal film is effective in combating wound pathogens and ideal for dressing development.
摘要
慢性创伤影响了600多万人, 特别是糖尿病人群. 各种抗菌物质已添加到纳米纤维素伤口敷料中, 以抑制微生物生长. 然而, 这些物质对人类造成了多重不利影响. 在这次交流中, 我们开发了一种阿魏酸接枝纤维素纳米晶薄膜, 作为伤口敷料开发的潜在抗菌材料. 采用酸水解法从医用棉中提取出平均长度为159±31nm的针状纤维素纳米晶. 纤维素纳米晶体、聚乙烯醇 (PVA) 和阿魏酸的组合产生了柔软、坚固、灵活、有弹性和非延展性的薄膜. 吸收大量渗出物, 肿胀率为774±57%. 阿魏酸的释放在20h达到平台, 显影膜的总释放量为75.4±7.9%. 阿魏酸接枝纤维素纳米晶膜可抑制2株革兰氏阳性菌、3株革兰氏阴性菌和1株酵母的生长. 在Hohenstein挑战和清洗耐用性期间, 即使在清洗20次后, 显影膜仍能通过减少高达82%的微生物生长保持其抗菌效率. 研究结果表明, 阿魏酸接枝纤维素纳米晶薄膜在对抗伤口病原体方面是有效的, 是敷料开发的理想材料.
Acknowledgments
All authors are grateful to Universiti Kuala Lumpur and Universiti Sains Malaysia for supporting this study.
Disclosure statement
No potential conflict of interest was reported by the author(s).