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Research Article

Application of modified PROMETHEE method for coating quality enhancement in thin film deposition processes

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Pages 2941-2962 | Accepted 15 Jun 2021, Published online: 28 Jun 2021
 

ABSTRACT

Thin film coatings are extensively used to enhance the physical and chemical properties of various materials by depositing a thin layer of coatings of different materials onto various substrates. Several deposition processes are available which are widely adopted by many manufacturing industries to meet such demands. To exploit the fullest potential of those deposition processes, it is often advised to operate them with the optimal combination of process parameters. In this research, a modified PROMETHEE (preference ranking organisation method for enrichment evaluation) method as an effective multi-objective optimisation tool is applied for identifying the optimal parametric combinations of two thin film deposition processes: silicon carbonitride thin film coating using a thermal chemical vapour deposition process and zirconium-containing diamond-like-carbon thin film coating using an unbalanced magnetron sputtering process. The derived optimal parametric combinations are validated based on developed regression equations, which exhibit that the proposed approach can attain better response values as compared to other popular optimisation techniques. The analysis of variance results and the developed surface plots further illustrate the influence of various deposition parameters on coating quality.

Abbreviations

PROMETHEE=

Preference Ranking Organization Method for Enrichment Evaluation

CVD=

Chemical Vapor Deposition

PVD=

Physical Vapor Deposition

PECVD=

Plasma-Enhanced Chemical Vapor Deposition

MCDM=

Multi-Criteria Decision Making

RSM=

Response Surface Methodology

PSO=

Particle Swarm Optimization

GA=

Genetic Algorithm

GRA=

Grey Relational Analysis

DR=

Deposition Rate

SR=

Surface Roughness

CdS=

Cadmium Sulphide

DLC=

Diamond-like-Carbon

Zr-DLC=

Zirconium-Containing Diamond-like-Carbon

ZnO=

Zinc Oxide

TiC-N=

Titanium Nitride Carbide

TiN=

Titanium Nitride

TiO2=

Titanium Dioxide

DoE=

Design of Experiment

TOPSIS=

Technique for Order of Preference by Similarity to Ideal Solution

SiCN=

Silicon Carbonitride

ANOVA=

Analysis Of Variance

Pj(a,b)=

Preference Function

ρ+(a)=

Positive Outranking Flow

ρ(a)=

Negative Outranking Flow

wi=

Weights

NOF=

Net Outranking Flow

H=

Hardness

YM=

Young’s Modulus

G-peak=

Graphite-like Carbon Peak

D-peak=

Defective Carbon Peak

CoF=

Coefficient of Friction

WR=

Wear Rate

WCA=

Water Contact Angle

Acknowledgements

The author is grateful to the experts who have helped in the MCDM process. The author would also like to thank Kumar et al. [6], and Yang and Huang [7] for giving permission to use their experimental data for this analysis.

Disclosure statement

No potential conflict of interest was reported by the author(s).

Additional information

Funding

This research did not receive any specific grant from funding agencies in the public, commercial, or not-for-profit sectors.

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