ABSTRACT
A semicircle control chart can be used in detecting both increases and decreases in the mean and/or variance. In this paper, we propose two modified semicircle charts for detecting a reduction in the process variance, a.k.a. process improvement. Each of these modified semicircle charts, namely, SC1 and SC2 has two limits, defined by the inner and outer semicircles. A process improvement is detected by the SC1 scheme if a point is plotted inside the smallest semicircle, or if two successive points are plotted between the inner and outer semicircles and by the SC2 scheme if a point plots inside the smallest semicircle or if two of three successive points plot between the inner and outer semicircles. It will be shown that the two modified semicircle charts have superior average run length (ARL) performances to the basic semicircle chart in the detection of process improvement. The ARL study is conducted by means of a simulation.