Editorial

In this issue we feature in the Bulletin pages an interesting joint contribution from Loughborough University and Hart Materials on whether the structure of Ni ions in the three main Ni electrolytes is affected by the different anionic species present, and what effects this has, if any, on deposit properties. Also featured is research by Surviliene and his colleagues at the Centre for Physical Science and Technology in Vilnius on the effect of glycine and oxalate as additives to trivalent Cr baths containing divalent Ni on the electrodeposition and morphology of Cr-Ni alloy coatings.

Zhou et al. (Corrosion and Protection Centre, University of Manchester) discuss the origin of streaks on anodised AA6063-T6 alloy extrusions using optical and electron microscopies, and highlight a link to grain size and crystallographic orientation.

Electrochemical nucleation behaviour and properties of electrodeposited Co-Ni alloy thin films, obtained from a chloride – boric acid electrolyte have been studied by Azizi and colleagues (Université F. Abbas Sétif, Algeria, and Universities of Belfort-Montbéliard and Strasbourg in France), and a cyclic voltammetry study of the effects of additives in an acetate bath on the electrodeposition of Ni is described by Srinivasan and Bapu of CECRI, India.

Ozyilmaz and Akdag (University of Mustafa Kemal) extend their previous work1 with a report on corrosion protection provided by homo- and copolymer films synthesised in various oxalic and sulphamic acid electrolyte mixtures. The effects of new aliphatic and aromatic diamine additives on rate of nickel deposition, and morphology and brightness of deposit, are described by Moustafa et al. of Alexandria University, Egypt.

A hundred years ago, on 12^th September 1912, Dr. Max Schlötter founded the company which bears his name. We congratulate Schlötter, one of our industry's major supply houses, on reaching their century. David Gabe has contributed a biography of the founder elsewhere in this issue.

As a final word in this editorial, we wish all our contributors and readers a happy and productive 2013, and thank everyone for their continued support of the journal.

Clive Larson