Fabrication of hemispherical nanopatterns on 3D microsurface

Abstract

This paper presents a simple and cost‐effective method for fabrication of the micro–nano hybrid structure, which is formed a number of nanodots on three‐dimensional pyramid micropattern arrays. The conventional approaches for fabrication of the micro–nano hybrid structure have been used: micro/nano electro mechanical systems technology such as e‐beam, X‐ray and hologram lithography. However, these methods require a long process time, high cost and limited fabrication area. In order to overcome these disadvantages, silicon anisotropic wet etching and aluminium anodising processes were used. First, concave micropyramid patterns (15 μm square patterns) were formed on the silicon substrate by KOH etching process, and then 1 μm aluminium was deposited on micropatterns. During the aluminium anodising process, concave nanopatterns of 200±10 nm were densely fabricated on the concave micropyramid patterns. Finally, convex nanopatterns on convex micropyramid patterns, that is, convex micro–nano hybrid patterns, were fabricated on polymethly methacrylate substrate by using hot embossing process.

Keywords:

• Micro–nano hybrid
• KOH wet etching
• Anodic aluminium Oxide
• Hot embossing

This research was supported by the Center for Nanoscale Mechatronics & Manufacturing (grant no. 06K1401‐00511), one of the 21st Century Frontier Research Programs, which are supported by Ministry of Education, Science and Technology, Korea. Also, this work was partly supported by the Regional Core Research Program funded by the Korea Ministry of Education, Science and Technology (Medical & Bio‐material Research Center).