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Original Article

Microstructure and properties of nc-TiC/a-C∶H films deposited by radio frequency reactive sputtering

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Pages 1669-1673 | Received 18 Sep 2010, Accepted 04 Nov 2010, Published online: 12 Nov 2013
 

Abstract

Amorphous carbon films containing titanium carbide (nc-TiC/a-C∶H) were deposited onto n-type silicon (100) by radio frequency reactive sputtering titanium target in an Ar–CH4 mixed atmosphere. The composition and microstructure of the films were characterised by means of X-ray photoelectron spectroscopy, field emitted SEM, XRD and Raman spectra. The mechanical and tribological properties of the films were measured by a nanoindentation tester and a ball-on-disc UMT–2MT tribometer. By adjusting the CH4 flowrate, Ti content in the films could be controlled, and a transition in structures of the films from loose polymer-like to glassy and dense nanostructure was observed. The density of coatings was improved by the introduction of TiC nanocrystalline particles. The mechanical and lubricious properties were different accordingly.

The authors are grateful to the National Natural Science Foundation of China (grant no. 50905177 and no. 50823008), the National 973 Project of China (grant no. 2007CB607601) and the Innovative Group Foundation from the National Natural Science Foundation of China (grant no. 50721062) for financial support.

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