Surface characterisation of carbon films produced by plasma chemical vapour deposition method

Abstract

Carbon films were deposited on Si (111) wafers by microwave electron cyclotron resonance/plasma assisted chemical vapour deposition using a benzene–argon gas mixture with different argon flowrates (5, 15 and 30 sccm). The structure, surface morphology and hardness were studied. The film surface has been characterised by Raman spectroscopy to study the hybridisation of carbon in the film, and Fourier transform infrared spectroscopy was conducted to obtain bonding characteristics. The morphology of the films has been inspected by atomic force microscopy.

Keywords:

• Carbon
• Film
• Argon
• Structure
• Morphology
• Hardness

The authors would like to thank the Chair of Surface and Materials Technology (LOT) at the University of Siegen, Germany, for support.