Improvement of properties of TiN coating by optimising microstructural design

Abstract

Multilayered TiN coating, with a microstructure of stackered up sandwiches, was successfully prepared by hollow cathode discharge method. The columnar epitaxial growth was obviously suppressed by introduction of the multilayered microstructure in the coating. The adhesion and wear resistance of the multilayered TiN coating was compared with those of the conventional TiN coating. The adhesion of the TiN coating to the substrate and the wear resistance of the TiN coating are obviously improved by optimising structural design. The multilayered microstructure of the coating piles up the dislocations and also inhibits the bulk flaking behaviour. The wear mechanism of the multilayered TiN coating is the microarea detachment.

Keywords:

• Adhesion
• Wear
• Multilayered TiN
• Microstructure

Acknowledgement

This work is financially supported by National High Technology Research and Development Program of China (grant no. 2009AA03Z103).