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Ferroelectrics Volume 247, 2000 - Issue 1
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Original Articles

The synthesis mechanism of complex oxide films formed in dense RF — plasma by reactive sputtering of stoichiometric targets

V. M. Mukhortov Institute of General Physics, Russian Academy of Science, Moscow, Russia
,
Y. I. Golovko Institute of General Physics, Russian Academy of Science, Moscow, Russia
,
G. N. Tolmachev Institute of General Physics, Russian Academy of Science, Moscow, Russia
&
A. N. Klevtzov Institute of General Physics, Russian Academy of Science, Moscow, Russia
Pages 75-83 | Published online: 15 Mar 2011

References

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