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Session J: Processing technologies

Direct wafer bonding and layer transfer-a new approach to integration of ferroelectric oxides into silicon technology

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Pages 169-178 | Received 08 Dec 1998, Published online: 09 Mar 2011

References

  • Wu , S. Y. 1976 . Ferroelectrics , 11 : 379
  • Lee , H. N. , Lim , M.-H. , Kim , T. T. , Kalkur , T. S. and Choh , S. H. 1998 . Jpn. J. Appl. Phys. , 37 : 1107
  • Park , B.-E. , Sakai , I. , Tokumitsu , E. and Ishiwara , H. 1997 . Appl. Surf. Sci. , 117 : 423
  • Pignolet , A. , Curran , C. , Alexe , M. , Senz , St. , Hesse , D. and Gosele , U. 1998 . Integrated Ferroelectrics , 21 : 485
  • McKee , R. A. , Walker , F. J. and Crisholm , M. F. 1998 . Phys. Rev. Lett. , 81 : 3014
  • Alexe , M. , Kastner , G. , Hesse , D. and Gosele , U. 1997 . Appl. Phys. Lett. , 70 : 3416
  • Alexe , M. , Scott , J. F. , Pignolet , A. , Hesse , D. and Gosele , U. 1998 . Integrated Ferroelectrics , 19 : 95
  • Alexe , M. , Senz , St. , Scott , J. F. , Pignolet , A. , Hesse , D. and Gösele , U. 1998 . Mater. Res. Symp. Proc. , 493 : 517
  • Alexe , M. , Senz , S. , Pignolet , A. , Hesse , D. and Gosele , U. 1998 . Proc. of the 4th European Conference on Application of Polar Dielectrics . ECAPD IV . 24–27 August 1998 , Montreux. Ferroelectrics . in press.
  • Alexe , M. , Hesse , D. and Gosele , U. 1998 . Materials Chemistry and Physics , 55 : 55
  • Alexe , M. 1998 . Appl. Phys. Lett. , 72 : 2283 E. H. Nicollian and J. R. Brews, MOS Physics and Technology, (John Wiley & Sons, New York, 1982), Chap. 5.
  • Stengl , R. , Ahn , K. Y. and Gosele , U. 1988 . Jpn. J. Appl. Phys. , 27 : L2364
  • Scon , J. F. 1998 . Ferroelectric reviews , 1 : 1
  • Massoud , H. Z. 1997 . Microelectronic Engineering , 36 : 95
  • Hartmann , A. J. , Lamb , R. N. , Scott , J. F. , Johnston , P. N. , El Bouanani , M. , Chen , C. W. and Robertson , J. 1998 . J., Korean Phys. Soc. , 32 : S1329
  • Watanabe , K. , Hartmann , A. J. , Lamb , R. N. and Scott , J. F. 1998 . J. Appl. Phys. , 84 : 2170
  • Hu , C. 1994 . J. Vac. Sci. Technol. B , 12 : 3237

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