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The Journal of Photographic Science Volume 6, 1958 - Issue 5

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Original Articles

Relationships between Optimal Exposure Characteristics of Photographic Materials

G.C. FarnellResearch Laboratories, Kodak Limited

Pages 141-143 | Published online: 22 Jul 2016

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https://doi.org/10.1080/00223638.1958.11736638

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J. H. Webb, J. Opt. Soc. Amer., 40, 3, 1950.
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W. F. Bern. Proc. Roy. Soc. (A), 174, 559, 1940.
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A. L. Karttuhanskii and P. V. Meiklyar, Zh. Eksp. Teoret. Fiz., 21, 693, 1951.
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C.E.K. Mees. “The Theory of the Photographic Process” (Revised Edition), The Macmillan Company, 1954, p. 204.
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