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The Journal of Photographic Science Volume 11, 1963 - Issue 2

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Original Articles

The Sensitometric Properties of Emulsions at a Low Level of Chemical SensitizationFootnote^*
* Communication Number 2338-H from the Kodak Laboratories.

G. C. FarnellResearch Laboratory, Kodak Limited, Wealdstone, Harrow, Middlesex., U.S.A.

P. G. PowellResearch Laboratory, Kodak Limited, Wealdstone, Harrow, Middlesex., U.S.A.

Pages 57-64 | Received 14 Jan 1963, Published online: 22 Jul 2016

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https://doi.org/10.1080/00223638.1963.11736900

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Farnell, G. C. J. Phot. Sci., 6, 83 (1958).
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Mizuki, E. and Fujisawa, S. Proc. Hakone Symposium, Maruzen Co. Ltd., Tokyo, p. 97 (1956). Edited by S. Fujisawa.
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Stevens, G. W. W. Phot. J., 82, 42 (1942).
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Stevens, G. W. W. Fundamental Mechanisms of Photographic Sensitivity. Butterworths Scientific Publications, London, p. 227 (1951). Edited by J. W. Mitchell.
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Trivelli, A. P. H. J. Franklin Inst., 241, 1(1946).
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Maurer, R. E. and Yule, J. A. C. J. Opt. Soc. Amer., 42, 402 (1952).
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Mizuki, E. J. Chem. Soc. Japan (Industrial Chemistry Section), 61, 836 (1958).
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