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The Journal of Photographic Science Volume 17, 1969 - Issue 4

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Original Articles

Microimage Photoresist EvaluationFootnote^*
* The Authors are now employed at Viatron Computer Systems Corp., Route 62. Bedford. Massachusetts 01730, U.S.A.

K.C. ClarkSprague Electric Co., Concord, New Hampshire, U.S.A

R.G. TurnerSprague Electric Co., Concord, New Hampshire, U.S.A

Pages 126-136 | Received 20 Oct 1969, Published online: 23 Jul 2016

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https://doi.org/10.1080/00223638.1969.11737493

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S. Tolansky, Multiple Beam Interforometry of Surfaces and Films. Clarendon Press, Oxford, England, 1948.
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V.A.M.F.O., Mrs. G. C. Schwartz, I.B.M. Corp., Kodak Seminar on Microminiaturization, June 1965.
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R. M. Finne and D. L. Klein, Journal of the Electrochemical Society, III, 63c, 1964.
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M. V. Sullivan, Gell Telephone Labs. Kodak Seminar on Microminiaturization, June, 1965.
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E. P. Donovan, Kodak Seminar on Microminiaturization, June 1965.
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W. Kornfeld. Photoresist Technology Improvement, May 1966.
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L. E. Martinson. The Technology of Microimage Resists. Kodak Seminar on Microminiaturization (2nd), April 1966. Eastman Kodak Company. Introduction to Photofabrication, p. 79. September 1966.
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Eastman Kodak Company. Incidental Intelligence about Kodak Resists. July 1967 and July 1968.
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G. F. Damon, R.C.A. Kodak Seminar on Microminiaturization (2nd), April 1966.
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