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Original Articles

Microimage Photoresist EvaluationFootnote*

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Pages 126-136 | Received 20 Oct 1969, Published online: 23 Jul 2016

References

  • S. Tolansky, Multiple Beam Interforometry of Surfaces and Films. Clarendon Press, Oxford, England, 1948.
  • V.A.M.F.O., Mrs. G. C. Schwartz, I.B.M. Corp., Kodak Seminar on Microminiaturization, June 1965.
  • R. M. Finne and D. L. Klein, Journal of the Electrochemical Society, III, 63c, 1964.
  • M. V. Sullivan, Gell Telephone Labs. Kodak Seminar on Microminiaturization, June, 1965.
  • E. P. Donovan, Kodak Seminar on Microminiaturization, June 1965.
  • W. Kornfeld. Photoresist Technology Improvement, May 1966.
  • L. E. Martinson. The Technology of Microimage Resists. Kodak Seminar on Microminiaturization (2nd), April 1966. Eastman Kodak Company. Introduction to Photofabrication, p. 79. September 1966.
  • Eastman Kodak Company. Incidental Intelligence about Kodak Resists. July 1967 and July 1968.
  • G. F. Damon, R.C.A. Kodak Seminar on Microminiaturization (2nd), April 1966.

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