References
- S. Tolansky, Multiple Beam Interforometry of Surfaces and Films. Clarendon Press, Oxford, England, 1948.
- V.A.M.F.O., Mrs. G. C. Schwartz, I.B.M. Corp., Kodak Seminar on Microminiaturization, June 1965.
- R. M. Finne and D. L. Klein, Journal of the Electrochemical Society, III, 63c, 1964.
- M. V. Sullivan, Gell Telephone Labs. Kodak Seminar on Microminiaturization, June, 1965.
- E. P. Donovan, Kodak Seminar on Microminiaturization, June 1965.
- W. Kornfeld. Photoresist Technology Improvement, May 1966.
- L. E. Martinson. The Technology of Microimage Resists. Kodak Seminar on Microminiaturization (2nd), April 1966. Eastman Kodak Company. Introduction to Photofabrication, p. 79. September 1966.
- Eastman Kodak Company. Incidental Intelligence about Kodak Resists. July 1967 and July 1968.
- G. F. Damon, R.C.A. Kodak Seminar on Microminiaturization (2nd), April 1966.