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Original Articles

Principles of PD Recording Systems and their Use in PhotofabricationFootnote

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Pages 96-105 | Received 19 Apr 1971, Published online: 23 Jul 2016

References

  • Jonker, H., van Beek, L. K. H., Houtman, H. J., Klostermann, F. T., and Spiertz, E. J., This Journal in preparation.
  • Neblette, C. B., “Photography its Materials and Processes”, 6th Edn., Van Nostrand Company, Inc., New York, 1962, p. 2.
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  • Philips, Brit. Pat., 1,175,747 (1969).
  • Faerman, G. P., and Voeikova, E. D., Usp.Nauchn.Fotogr. Akad.Nauk.SSSR, Otd.Khim.Nauk, 3, 174 (1955); Ibid., 4, 150 (1955).
  • Shuman, D. C., and James, T. H., Phot.Sci.Eng., 15, 42 (1971). These authors supplemented the view of Faerman and Voeikova (ref. 5) by stating that, apart from their electronic properties, the adsorption characteristics of the various types of nuclei (metallic, sulphidic) must be considered in evaluating catalytic activity.
  • Kenneth Mees, C. E., and James, T. H., “The Theory of the Photographic Process”, Macmillan Co., New York/London, 3rd Edn., 1966, p. 325.
  • See ref. 7, p. 324.
  • Tubbs, M. R., and Forty, A. J., Brit.J.Appl.Phys., 15, 1553 , (1964).
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  • See ref. 14, Example 13.
  • Sharp, D. J., Paper 262 presented at the 135th National Meeting of the Electrochemical Society, May 4-9, 1969.
  • Sharp, D. J., Henrickson, J., D’Amico, J., and Kenney, J., Paper 136 presented at the 136th National Meeting of the Electrochemical Society, Oct. 5-9, 1969.
  • Callaby, D. R., and Brotto, M., J.Phot.Sci., 18, 8 (1970).
  • Jonker, H., Dippel, C. J., Houtman, H. J., Molenaar, A., and Spiertz, E. J., Phot.Sci.Eng., 13, 33 (1969).
  • Eder, J. M., “Aüsftihrliches Handbuch der Photographie“, Band III 2. Teil, 6. Aufl., W. Knapp, Halle, 1930, p. 228.
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  • Jonker, H., Molenaar, A., and Dippel, C. J., Phot.Sci.Eng., 13, 38 (1969).
  • Manhardt, J. R., and Archambault, J. P., (Itek Corp.), U.S. Pat. 3,512,974 (1970).
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  • Ref. 20, p. 55.
  • See e.g. Hebb, L. E., Electrochem.Technol., 1, 217 (1963).
  • Ref. 20, p. 112.
  • Recent studies on the mechanism of electroless copper deposition :
  • Paunovic, M., Plating, 55, 1161 (1968).
  • Paunovic, M., Paper 146 presented at the 136th National Meeting of the Electrochemical Society, Oct. 5-9, 1969.
  • Okinaka, Y., Paper 144 presented at the 136th National Meeting of the Electrochemical Society, Oct. 5-9, 1969.
  • Saranov, E. J., Bulatov, N. K., and Mokruskin, S. G., Protection of Metals, 4, 142 (1968).
  • Sard, R., J.Electrochem.Soc., 117, 864 (1970).
  • A critical survey of the literature on the characteristics of electroless nickel and cobalt deposition can be found in:
  • Cavallotti, P" and Salvago, G., Electrochimica Metallorum, 3, 239 (1968).
  • Janssen, C. J. G. F., Jonker, H., and Molenaar, A., Plating, 57, 42 (1971). See also: Philips, Neth. Pat. Appl. 6,915,718 (1969) .
  • Stevens, G. W. W., “Microphotography-Photography and Photofabrication at Extreme Resolution”, 2nd. Edn., Chapman and Hall, London, 1968. Especially Chapter 11.
  • a. Jonker, H., Janssen, C. J. G. F., and Thijssens, Th. P. G. W. Ber. I. Intern. Kongress für Photographie und Film in Industrie und Technik, Köln 1966, Helwich, Darmstadt, 1968, p. 249.
  • Jonker, H., Veenendaal, H. J., Janssen, C. J. G. F., and van Langen, J. O. M., Proc.Symp.Inst. Metal Finishing, Folkestone, 20th Oct. 1966 (1967).
  • Jonker, H., Janssen, C. J. G. F., Dippel, C. J., Thijssens, Th. P. G. W., and Postma, L., Phot.Sci.Eng., 13, 45 (1969). See also: ref. 29.
  • Goetz, A., and Inn, E. C. Y., Rev. Mod.Phys., 20, 131 (1948).
  • Berman, E., Phot.Sci.Eng., 13, 50 (1969).
  • Philips, Neth. Pat. Appl. 6,712,933 (1967).
  • Jonker, H., Dippel, C. J., Houtman, H. J., Janssen, C. J. G. F., and van Beek, L. K. H., Phot.Sci.Eng., 13, 1 (1969), Table 6, p. 8.
  • Philips, Neth. Pat. Appl. 7,001,820 (1970).

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