References
- Jonker, H., Van Beek, L. K. H., Dippel, C J., Janssen, C J. G. F., Molenaar, A., and Spiertz, E. J., J. Phot. Sci., 19, 96 (1971).
- Van Zwet, H., and Kooyman, E. C, Rec. Trap. Chilli., 86, 993 (1967).
- Van Beek, L. K. H., Van Beek, J. R. G. C. M., Boven, .I., and Schoot, C. J. J., J. Org. Chelll., 36,2194 (1971).
- Jonker, H., Thijssens, Th. P. G. W., and Van Beek, L. K. H., Rec. Trav. Chil1l., 87, 997 (1968).
- Van Beek, L. K. H., and Van Beek, J. R. G. C. M.,unpublished results.
- Determined by.l. R. G. C. M. van Beek (These laboratories).
- Kerwin, R. ., and Stanionis, C. V., Electrochelll. Technology, 6, 463 (1968).
- Solman, L. R., J. Photo Sci., 18,136 (1970).
- Stevens, G. W. W., J. Photo Sci., 14, 153 (1966).
- Values for KOR and KPR, both product of Eastman Kodak Co., can be derived from a paper of Kerwin (Ref. 12, Fig. 5). We could not trace the data for Kodak Metal-Clad Plate N. However, the values of KTFR Illay be used as a guide, since this chromium-coated glass plate has an overcoal of 0.6 pm of the resist in question.
- Lovering, H. B., Solid State Technology, II (no. 7), 39 (1968).
- Kerwin, R. E., Be" Systelll Tech. J., 49,2179 (1970).
- Htoo, M. S., Kodak Photoresist Seminar Proceedings-1968 Edition, Vol. I, p. 25; see also Htoo, M. S., PIlOt. Sci. Eng., 12,169 (1968).
- Techniques of Microphotography, Kodak Publication No. P-52 (1967), p. 51.