1
Views
0
CrossRef citations to date
0
Altmetric
Photographic Technology Supplement

Photographic techniques for microelectronicsFootnote

Pages 70-78 | Received 01 Dec 1976, Published online: 22 Jul 2016

References

  • See, for example
  • Eisler, P., Technology of Printed Circuits, Heywood and Co. Ltd. (London), 1959.
  • Keonjian, E. (Ed.), Microelectronics, McGraw-Hill Book Co. (New York), 1963.
  • Beale, J. R. A., Emms, E. T. and Hilbourne, R. A., Microelectronics, Taylor and Francis (London), 1971.
  • Semiconductor Network report on Reliability, Texas Instrument Inc. (Dallas, Texas), 1962.
  • Stevens, G. W. W., Photographic materials and processes used for microelectronics, Galvanotechnik, 65, 357-388 (1974 GERMAN). The Production Engineer, 53, 437-445 (1974).
  • Hey, D. H. (Ed.), Kingzetts Chemical Encyclopaedia, Ballière, Tindall and Cassell Ltd., 9th Edn. (1966), p. 877.
  • Lenard, J. A. and Patzner, E. J., “A survey of crystal growing processes and equipment” in Marshal, S. L. (Ed.), Microelectronic Technology, Boston Technical Publishers Inc., Cambridge (Mass.), 1967.
  • Eastman Kodak Co., Techniques of Microphotography, Industrial Data Book, P-52 (Rochester, New York), 1963.
  • Anon., J. Scientific Instruments, 18, 66 (1941).
  • Dwyer, J. L., Contamination Analysis and Control, Reinhold Publishers Corp. (New York), 1966.
  • Hellmer, T. C. Jr. and Nall, J. R., “Microphotographs for Electronics”, Semiconductor Products, 4, January 1961. Reprinted as Eastman Kodak Pamphlet No. P-45.
  • Guild, J., Diffraction Gratings as Measuring Scales, Oxford University Press (London), 1960.
  • Stevens, G. W. W., Microphotography, Chapman and Hall (London), 2nd Edn., 1968, pp. 285-295.
  • Farmer, P. J., “Digital Control and Programming”, Aircraft Production, 18, 256 (1956).
  • Stevens, G. W. W., “Chemical and Plastic factors in the processing of Photographic Emulsions to Semiconductor Masks, J. photogr. Sci, 24, 220 (1976).
  • As reference 10b, pp. 110-114.
  • Society of Photographic Scientists and Engineers, Microphotography Symposium, Boston, 1968, pp. 17-51.
  • As reference 10b, p. 27.
  • Kerwin, R. E., “Dyed photographic emulsions for improved recording of projected images” in Proceedings Kodak Photoresist Seminar, 1969, Eastman Kodak Co. (Rochester, New York), Pamphlet P-209, p. 18.
  • Eastman Kodak Co., Revised edition of Techniques of Microphotography, Rochester, New York, 1970, Pamphlet P-52.
  • Rank Precision Industries, Metrology Division, Leicester. Pamphlet MICROLINER. See also British Patent 1,248,564.
  • Altman, J. H. and Schmitt, H. C. Jr., “On the optics of thin films of resist over chrome” in Kodak Photoresist Seminar Proceedings, 1968, Vol. II, Eastman Kodak Co. (Rochester, New York), Pamphlet No. P-I92B, p. 12.
  • As reference lc, p. 121.
  • As reference lc, p. 117.
  • For example:
  • Axelrod, N. N., “Intensity Spatial Filtering applied to Defect Detection in Integrated Circuit Photomasks”, Proc. I.E.E.E., 60, 447 (1972).
  • West, P., Optical Transform Technique for Automatic Pattern Inspection, Metron, 3, 186_(1971).
  • Millipore Ltd. Application Booklet, MC Particle Measurement Computer System No. PB.402.
  • As reference lc, p. 129.
  • Donaldson, P. E. K. and Davies, J. G., “Microelectronic devices for surgical implantation”, Radio and Electronic Engineer, 43, 125-132 (1973).

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.