References
- Allen, D. M., Horne, D. F. and Stevens, G. W. W., “Quantitative examination of photofabricated profiles: Part 1, Design of experiments” J. photogr. Sci., 25, 254 (1977).
- Allen, D. M., Horne, D. F. and Stevens, G. W. W., “Preparation of specimens for microscopic examination of edge profiles”,/. Micro, (in press, Paper Ref. 1730).
- Davis, R. and Pope, C. I., Techniques for Ruling and Etching Precise Scales in Glass and their Reproduction by Photoetching with a New Light-sensitive Resist, National Bureau of Standards, Circular 565 (August 1955).
- DeForest, W. S., Photoresist Materials and Processes, McGraw- Hill, New York (1975), Ch. 4.
- Kodak Ltd., Photofabrication using Kodak Photoresist, Type 3 and Ancillary Chemicals (July 1976), pp. 4-5.
- Stevens, G. W. W., “ ’Sayce’ test chart of modified design”, J. photogr. Sci. , 25, 38 (1977).
- Lundstrom, G., “An investigation of fluidic element fabrication techniques, especially chemical milling of stainless steel”, Fourth Cranfield Fluidics Conference, 17-20 March 1970, Coventry, Paper D2.
- Springborn, R. K. (Ed.), “Non-traditiona! machining processes”, ASTME (1967), pp. 74-5.