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The Journal of Photographic Science Volume 26, 1978 - Issue 5
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Original Articles

Conventional and Self-Developing Photothermoplastic Devices: Sensitivity and Rapid DevelopmentFootnote

U. KillatPhilips GmbH Forschungslaboratorium Hamburg, 2000 Hamburg 54, West Germany
&
D. R. TerrellPhilips GmbH Forschungslaboratorium Hamburg, 2000 Hamburg 54, West Germany
Pages 183-188 | Received 24 Apr 1978, Published online: 22 Jul 2016

References

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  • Colburn, W. S. and Tompkins, E. N., Appi. Optics, 13, 2934 (1974).
  • Killat, U. and Terrell, D. R., Optica Acta, 24, 441 (1977).
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  • Butter, C. D. and Lee, T. C., IEEE Trans., C24, 402 (1975). Stewart, W. C., Mezrich, R. S., Cosentino, L. S., Nagle, E. M., Wendt, F. S. and Lohman, R. D., RCA Rev., 34, 3 (1973).
  • Terrell, D. R. and Killat, U., to be published.
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  • See, for example, Ferry, J. D., Viscoelastic Properties of Polymers, 2nd ed., Wiley, New York (1970).
  • Krumme, J.-P., Heitmann, H., Mateika, B. and Witter, K., J. appi Phys., 48, 366 (1977).

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