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The Journal of Photographic Science Volume 28, 1980 - Issue 4
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Original Articles

The Dependence of Maximum Density on Chemical Sensitization

G. C. FarnellResearch Division, Kodak Limited, Headstone Drive, Harrow, Middlesex, HAl 4TY
Pages 145-148 | Received 02 Feb 1980, Published online: 21 Jul 2016

References

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  • Berg, W. F., Marriage, A. and Stevens, G. W. w., Photogr. J., 81, 413
  • Sutherns, E. A., J. photogr. Sci., 9, 217 (1961).
  • Stevens, G. W. W., in Fundamental Mechanisms of Photographic Sensitivity (J. W. Mitchell, Ed.), Butterworths, London (1951), p. 227.
  • Farnell, G. C., Jenkins, R. L. and Solman, L. R., J. photogr. Sci., 24, 1 (1976).
  • Hautot, A. and Sauvenier, H., Sci. Ind. Photogr., (2) 24, 257 (1953).
  • Spencer, H. E., Brady, L. E. and Hamilton, J. F., J. Opr. Soc. Amer., 54, 492 (1964).
  • Farnell, G. c., Flint, R. D., Chanter, J. B. and Judd, F. S., J. photogr. Sci., 14, 125 (1966).
  • Farnell, G. c., J. photogr. Sci., 24, 169 (1976).
  • Derdman, R. W., J. photogr. Sci., 21, 1(1973).
  • Farnell, G. C. and Powell, P. G., J. photogr. Sci., 11, 57 (1963).

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