0
Views
0
CrossRef citations to date
0
Altmetric
Photographlc Technology Section

Photography and Microelectronics

Pages 130-133 | Received 15 May 1982, Published online: 21 Jul 2016

References

  • Beale, J. R. A., Emms, E. T. and Hilbourne, R. A., Microlectronics, Taylor and Francis Ltd., London (PHI).
  • Hepher. M. “The photo-resist story”, J. phatogr. Sci, 12, 181 (1964).
  • Stevens. G. W. W., “Photographic techniques for microelectronics”, J. phatogr. Sci., 25, 70(1977).
  • Stevens, G. W. W., Microphotography: Photography and Photofabrication at Extreme Resolution, 2nd ed., Chapman and Hall, London, and John Wiley, New York. (1968).

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.