Publication Cover
Ozone: Science & Engineering
The Journal of the International Ozone Association
Volume 27, 2005 - Issue 2
115
Views
2
CrossRef citations to date
0
Altmetric
Original Articles

Role of O3 and OH· Radicals in Ozonated Aqueous Solution for the Photoresist Removal of Semiconductor Fabrication

&
Pages 139-146 | Published online: 18 Jan 2007

References

  • Chelkowska , K. , Grasso , D. , Fabian , I. and Gordon , G. 1992 . Numerical Simulations of Aqueous Ozone Decomposition . Ozone Sci. Eng. , 14 : 33 – 49 . [CSA]
  • DeGendt , S. , Wauters , J. and Heyns , M. 1998 . A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry . Solid State Technology , 41 : 57 – 60 .
  • DeGendt , S. , Snee , P. , Cornelissen , I. , Lux , M. , Vos , R. , Mertens , P. W. , Knotter , D. M. , Meuris , M. M. and Heyns , M. 1999 . A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry . Solid State Phenomena , 65–66 : 165 – 168 .
  • Gottschalk , C . March 14 2000 . Personal communication , March 14 , Santa Clara, CA : 19th Semiconductor Pure Water and Chemical Conference .
  • Heyns , M. M. , Bearda , T. , Cornelissen , I. , DeGendt , S. , Degraeve , R. , Groeseneken , G. , Kenens , C. , Knotter , D. M. , Loewenstein , L. M. , Mertens , P. W. , Mertens , S. , Meuris , M. , Nigam , T. , Schaekers , M. , Teerlinck , I. , Vandervorst , W. , Vos , R. and Wolke , K. 1999 . Cost-Effective Cleaning and High-Quality Thin Gate Oxides . IBM J. Res. Dev. , 43 ( 3 ) : 339 – 350 .
  • Hoigné , J. and Bader , H. 1978 . Ozone Initiated Oxidations of Solutes in Wastewater: Reaction Kinetic Approach . Prog. Water Technol. , 10 : 657 – 671 .
  • Kashkoush , I. , Novak , R. and Matthews , R. A Novel Method for Photoresist Stripping Using Ozone/Deionized Water Chemistry . 1997 IEEE International Symp. on Semiconductor Manufacturing Conference Proc. 1997 , San Francisco, CA. pp. 81 – 84 . San Francisco, CA
  • Langlais , B. , Rechhow , D. A. and Brink , D. R. 1991 . Ozone in Water Treatment: Application and Engineering , 12 Chelsea, MI : Lewis Publishers .
  • Nelson , S. 1999 . Ozonated water for photoresist removal . Solid State Technol. , 42(July) : 107 – 112 .
  • Ohmi , T. , Isagawa , T. , Kogure , M. and Imaoka , T. 1993 . Native Oxide Growth and Organic Impurity Removal on Si Surface with Ozone-Injected Ultrapure Water . J. Electrochem. Soc. , 140 ( 3 ) : 804 – 810 .
  • Staehelin , J. and Hoigné , J. 1982 . Decomposition of Ozone in Water: Rate of Initiation by Hydroxide Ions and Hydrogen Peroxide . Environmental Sci. Technol. , 16 : 676 – 681 . [CSA]
  • Staehelin , J. and Hoigné , J. 1985 . Decomposition of Ozone in Water in the Presence of Organic Solutes Acting as Promoters and Inhibitors of Radical Chain Reactions . Environ. Sci.Technol. , 19 : 1206 – 1213 . [CSA]
  • Taube , H. and Bray , W. C. 1940 . Chain Reactions in Aqueous Solutions Containing Ozone, Hydrogen Peroxide, and Acid . J. Am. Chem. Soc. , 62 : 3357 – 3373 .

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.