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Journal of the Chinese Institute of Engineers Volume 18, 1995 - Issue 4
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Amorphous silicon thin film transistors

Jyh‐Ling Lin Department of Electrical Engineering, National Taiwan University, Taipei, Taiwan, R.O.C.
&
Si‐Chen Lee Hua Fan College of Humanity and Technology, National Taiwan University, Taipei, Taiwan, R.O.C.
Pages 451-460 | Received 11 Aug 1993, Accepted 09 Nov 1994, Published online: 04 May 2011

References

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  • Tsai , H.K. , Lin , W.J. , Cheng , J.S. and Lin , T.L. “Origin of Instability Mechanism in a‐Si:H Thin Film Transistor,” . Proc. of International Electron Devices and Materials Symposium (EDMS) . Hsinchu, Taiwan. pp. 450 – 453 .
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  • Correspondence addressee

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