197
Views
11
CrossRef citations to date
0
Altmetric
Research Articles

Factors influencing the nanostructure of obliquely deposited thin films

ORCID Icon, &
Pages 227-233 | Received 23 Dec 2017, Accepted 12 Mar 2018, Published online: 03 Apr 2018

References

  • Schubert MF, Poxson DJ, Mont FW, et al. Performance of antireflection coatings consisting of multiple discrete layers and comparison with continuously graded antireflection coatings. Appl Phys Express. 2010;3:082502. doi: 10.1143/APEX.3.082502
  • Chhajed S, Poxson DJ, Yan X, et al. Nanostructured multilayer tailored-refractive-index antireflection coating for glass with broadband and omnidirectional characteristics. Appl Phys Express. 2011;4:052503. doi: 10.1143/APEX.4.052503
  • Park YJ, Sobahan KMA, Hwangbo CK. Wideband circular polarization reflector fabricated by glancing angle deposition. Opt Express. 2008;16:5186–5192. doi: 10.1364/OE.16.005186
  • Kannarpady GK, Sharma R, Liu B, et al. Silane decorated metallic nanorods for hydrophobic applications. Appl Surf Sci. 2010;256:1679–1682. doi: 10.1016/j.apsusc.2009.09.093
  • Yan X, Poxson DJ, Cho J, et al. Enhanced omnidirectional photovoltaic performance of solar cells using multiple-discrete-layer tailored- and low-refractive index anti-reflection coatings. Adv Funct Mater. 2013;23:583–590. doi: 10.1002/adfm.201201032
  • Zhao YP, Li SH, Chaney SB, et al. Designing nanostructures for sensor applications. J Electron Mater. 2006;35:846–851. doi: 10.1007/BF02692538
  • Ye F, Zhao L, Mu C, et al. Influence of yttrium addition on reactive sputtered W–Y–N coatings. Surf Eng. 2017;33:626–632. doi: 10.1080/02670844.2016.1231758
  • Liu E, Pu J, Zeng Z, et al. Characterisation of amorphous/nanocrystalline multilayer Si3N4–Si3N4/Si2N2O films prepared by alternately sputtering. Surf Eng. 2017;33:633–641. doi: 10.1080/02670844.2017.1292704
  • Surabi MA, Chandradass J, Park SJ. ZnO-Based thin film transistor fabricated using radio frequency magnetron sputtering at Low temperature. Mater Manuf Process. 2015;30:175–178. doi: 10.1080/10426914.2014.892973
  • Choudhary RK, Mishra P, Hubli RC. Optical properties of cubic AlN films grown by sputtering. Surf Eng. 2017;32:304–306. doi: 10.1179/1743294414Y.0000000399
  • Li N, Liu ZT, Feng LP, et al. Composition and optoelectrical properties of sputtering MoSex films. Surf Eng. 2016;32:299–303. doi: 10.1179/1743294415Y.0000000081
  • Xi JQ, Schubert MF, Kim JK, et al. Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection. Nat Photonics. 2007;1:176–179. doi: 10.1038/nphoton.2007.26
  • Xi JQ, Kim JK, Schubert EF, et al. Very low-refractive-index optical thin films consisting of an array of SiO2 nanorods. Opt Lett. 2006;31:601–603. doi: 10.1364/OL.31.000601
  • Ahmad NH, Hameed I, Najim JA. The observation of surface spin wave modes in nickel films evaporated at oblique incidence. Phys B. 1994;203:17–21. doi: 10.1016/0921-4526(94)90273-9
  • Karabacak T, Wang GC, Lu TM. Quasi-periodic nanostructures grown by oblique angle deposition. J Appl Phys. 2003;94:7723–7728. doi: 10.1063/1.1621717
  • Lu L, Zhang F, Xu Z, et al. Characteristics of ZnS nanocolumn arrays and their effect on the light outcoupling of OLEDs. Phys B. 2010;405:3728–3731. doi: 10.1016/j.physb.2010.05.075
  • Sarkar S, Pradhan SK. Tailoring of optical and wetting properties of sputter deposited silica thin films by glancing angle deposition. Appl Surf Sci. 2014;290:509–513. doi: 10.1016/j.apsusc.2013.11.006
  • Petrov I, Barna PB, Hultman L, et al. Microstructural evolution during film growth. J Vac Sci Technol A. 2003;21:S117–S128. doi: 10.1116/1.1601610
  • Nieuwenhuizen JM, Haanstra HB. Microfractography of thin films. Philips Tech Rev. 1966;27:87–91.
  • Tait RN, Smy T, Brett MJ. Modelling and characterization of columnar growth in evaporated films. Thin Solid Films. 1993;226:196–201. doi: 10.1016/0040-6090(93)90378-3
  • Flickyngerova S, Netrvalova M, Sutta P, et al. Effects of sputtering power and pressure on properties of ZnO:Ga thin films prepared by oblique-angle deposition. Thin Solid Films. 2011;520:1233–1237. doi: 10.1016/j.tsf.2011.06.073
  • Zeuner M, Neumann H, Zalman J, et al. Characterization of a modular broad beam ion source. J Appl Phys. 1998;83:5083–5086. doi: 10.1063/1.367325
  • Macias-Montero M, Garcia-Garcia FJ, Alvarez R, et al. Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures. J Appl Phys. 2012;111:054312. doi: 10.1063/1.3691950
  • Park YJ, Sobahan KMA, Nam HJ, et al. Optical and structural properties of ZnO thin films fabricated by using oblique angle deposition. J Korean Phys Soc. 2010;57:1657–1660. doi: 10.3938/jkps.57.1657
  • Hawkeye MM, Brett MJ. Glancing angle deposition: fabrication, properties, and applications of micro- and nanostructured thin films. J Vac Sci Technol A. 2007;25:1317–1335. doi: 10.1116/1.2764082
  • Bae KJ, Jeong EW, Ju JH, et al. Electrical properties and microstructure of chromium thin films produced by glancing angle deposition. Sci Adv Mater. 2016;8:1838–1843. doi: 10.1166/sam.2016.2895
  • Dew SK, Smy T, Brett MJ. Step coverage, uniformity and composition studies using integrated vapour transport and film-deposition models. Jpn J Appl Phys. 1994;33:1140–1145. doi: 10.1143/JJAP.33.1140
  • Sit JC, Vick D, Robbie K, et al. Thin film microstructure control using glancing angle deposition by sputtering. J Mater Res. 1999;14:1197–1199. doi: 10.1557/JMR.1999.0162
  • Machlin ES. Materials science in microelectronics: The relationship between thin film processing and structure. New York: Giro Press; 1995.
  • Toledano D, Galindo RE, Yuste M, et al. Compositional and structural properties of nanostructured ZnO thin films grown by oblique angle reactive sputtering deposition: effect on the refractive index. J Phys D Appl Phys. 2013;46:045306. doi: 10.1088/0022-3727/46/4/045306
  • Palmero A, Rudolph AH, Habraken FHPM. One-dimensional analysis of the rate of plasma-assisted sputter deposition. J Appl Phys. 2007;101:083307. doi: 10.1063/1.2720257
  • Palmero A, Rudolph H, Habraken FHPM. Gas heating in plasma-assisted sputter deposition. Appl Phys Lett. 2005;87:071501. doi: 10.1063/1.2010609
  • Palmero A, Rudolph H, Habraken FHPM. Generalized Keller–Simmons formula for nonisothermal plasma-assisted sputtering depositions. Appl Phys Lett. 2006;89:211501. doi: 10.1063/1.2392830
  • Barranco A, Borras A, Gonzalez-Elipe AR, et al. Perspectives on oblique angle deposition of thin films: from fundamentals to devices. Prog Mater Sci. 2016;76:59–153. doi: 10.1016/j.pmatsci.2015.06.003
  • Gil-Rostra J, Cano M, Pedrosa JM, et al. Electrochromic behavior of WxSiyOz thin films prepared by reactive magnetron sputtering at normal and glancing angles. Appl Mater Interfaces. 2012;22:628–638. doi: 10.1021/am2014629

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.