Mechanical properties of TiN films prepared in glow-arc transition region

References

• Enriquez-Flores CI, Cruz-Valeriano E, Gutierrez-Peralta A, et al. Relation between work function, microstructural and mechanical properties of TiN-films. Surf Eng. 2018;34(9):660–666. doi: 10.1080/02670844.2017.1385233
   Web of Science ®Google Scholar
• Viswanathan S, Mohan L, Bera P, et al. Corrosion and wear resistance properties of multilayered diamond-like carbon nanocomposite coating. Surf Interface Anal. 2018;50(3):265–276. doi: 10.1002/sia.6353
   Web of Science ®Google Scholar
• Kachalin GV, Mednikov AF, Tkhabisimov AB, et al. Studies of the Cr-CrN coating characteristics formed by means of the magnetron sputtering method from bulk target. J Phys Conf Ser. 2017;872(1):012040. doi: 10.1088/1742-6596/872/1/012040
   Google Scholar
• Jin J, Duan HJ, Li XH. The influence of plasma nitriding on microstructure and properties of CrN and CrNiN coatings on Ti6Al4 V by magnetron sputtering. Vacuum. 2017;136:112–120. doi: 10.1016/j.vacuum.2016.11.033
   Web of Science ®Google Scholar
• Lain GC, Cemin F, Menezes CM, et al. Bias influence on titanium interlayer for titanium nitride films. Surf Eng. 2016;32(4):279–283. doi: 10.1179/1743294415Y.0000000097
   Web of Science ®Google Scholar
• Feng L, Jiang BL, Yang C, et al. Effects of volt-ampere characteristics in positive-ohm and anti-ohm sections on coating uniformity and film-substrate adhesion strength. Rare Metal Mat Eng. 2016;45(9):2458–2461.
   Web of Science ®Google Scholar
• Yang C, Jiang BL, Liu Z, et al. Nanocrystalline titanium films deposited via thermal-emission-enhanced magnetron sputtering. Thin Solid Films. 2015;597:117–124. doi: 10.1016/j.tsf.2015.11.038
   Web of Science ®Google Scholar
• Belykh SF, Tolstoguzov AB, Lozovan AA, et al. Model for the emission of quasi-thermal atoms during sputtering of metals in the nonlinear collision cascade regime. J Exp Theor Phys+. 2014;118(4):560–568. doi: 10.1134/S1063776114030029
   Web of Science ®Google Scholar
• Ghasemi S, Farhadizadeh AR, Ghomi H. Effect of frequency and pulse-on time of high power impulse magnetron sputtering on deposition rate and morphology of titanium nitride using response surface methodology. T Nonferr Metal Soc. 2019;29(12):2577–2590. doi: 10.1016/S1003-6326(19)65165-4
   Web of Science ®Google Scholar
• Kumar P, Bansal D, Anuroop, et al. Optimization of titanium nitride film for high power RF MEMS applications. J Electron Mater. 2019;48(10):6431–6436. doi: 10.1007/s11664-019-07435-9
   Web of Science ®Google Scholar
• Lordanova I, Kelly PJ, Burova M, et al. Influence of thickness on the crystallography and surface topography of TiN nano-films deposited by reactive DC and pulsed magnetron sputtering. Thin Solid Films. 2012;520(16):5333–5339. doi: 10.1016/j.tsf.2012.03.097
   Web of Science ®Google Scholar
• Kumar R, Kumar V. Effect of high energy Ti9+ ion beam induced modifications in titanium dioxide and tin oxide nanocomposite thin films and detailed analysis of optical, structural and morphological properties. Opt Mater. 2019;88:320–332. doi: 10.1016/j.optmat.2018.11.040
   Web of Science ®Google Scholar
• Yu LH, Li Y, Ju HB, et al. Microstructure, mechanical and tribological properties of magnetron sputtered VCN films. Surf Eng. 2017;33(12):919–924. doi: 10.1080/02670844.2016.1277630
   Web of Science ®Google Scholar
• Zhang ZH, Zhao F, Yang W, et al. Effect of pulse power on the Phase structure and Spectral properties of SiCx Thin films containing Si quantum dots. Spectrosc Spect Anal. 2019;39(2):529–534.
   Web of Science ®Google Scholar
• Yang C, Jiang BL, Liu Z, et al. Structure and properties of Ti films deposited by dc magnetron sputtering, pulsed dc magnetron sputtering and cathodic arc evaporation. Surf Coat Tech. 2016;304:51–56. doi: 10.1016/j.surfcoat.2016.06.083
   Web of Science ®Google Scholar
• Petrov I, Barna PB, Hultman L, et al. Microstructural evolution during film growth. J Vac Sci Technol A. 2003;21(5):S117–S128. doi: 10.1116/1.1601610
   Web of Science ®Google Scholar
• Wang Y, Yang J, Huang JH, et al. Hot isostatic diffusion bonding tungsten alloy and high-strength steel Part I: Design and preparation of Ni-Si-B interlayer by magnetron sputtering. J Manuf Process. 2018;35:360–367. doi: 10.1016/j.jmapro.2018.08.024
   Web of Science ®Google Scholar
• Ye F, Zhao L, Mu C, et al. Influence of yttrium addition on reactive sputtered W-Y-N coatings. Surf Eng. 2017;33(8):626–632. doi: 10.1080/02670844.2016.1231758
   Web of Science ®Google Scholar
• Banko L, Ries S, Grochla D, et al. Effects of the ion to growth flux ratio on the constitution and mechanical properties of Cr1-x-Al-x-N thin films. Acs Comb Sci. 2019;21(12):782–793. doi: 10.1021/acscombsci.9b00123
   PubMed Web of Science ®Google Scholar