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Aerosol Science and Technology Volume 36, 2002 - Issue 5
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Original Articles

Exhaust Aerosol of a Plasma Enhanced CVD System: II. Electrical Charging and Transport

Bruce R. Forsyth Particle Technology Laboratory, Mechanical Engineering Department, University of Minnesota, Minneapolis, Minnesota
&
Benjamin Y. H. Liu Particle Technology Laboratory, Mechanical Engineering Department, University of Minnesota, Minneapolis, Minnesota
Pages 526-535 | Published online: 30 Nov 2010

  • Barnes , M. S. , Keller , J. H. , Forster , J. C. , O'Neil , J. A. and Coultas , D. K. 1992 . Transport of Dust Particles in Glow-Discharge Plasmas . Phys. Rev. Lett. , 68 : 313 – 316 .
  • Boeuf , J.-P. 1987 . Numerical Model of Rf Glow Discharge . Phys. Rev. A , 36 : 2782 – 2792 .
  • Bouchoule , A. , Plain , A. , Boufendi , L. , Blondeau , J. Ph. and Laure , C. 1991 . Particle Generation and Behavior in a Silane-Argon Low-Pressure Discharge Under Continuous or Pulsed Radio-Frequency Excitation . J. Appl. Phys. , 70 : 1991 – 2000 .
  • Carlile , R. N. , Geha , S. , O'Hanlon , J. R and Stewart , J. C. 1991 . Electrostatic Trapping of Contamination Particles in a Process Plasma Environment . Appl Phys. Lett. , 59 : 1167 – 1169 .
  • Cecchi , J. L. 1990 . “ Introduction to Plasma Concepts and Discharge Configurations ” . In Handbook of Plasma Processing Technology , Edited by: Rossnagel , S. M. , Cuomo , J. J. and Westwood , W. D. 14 – 69 . Park Ridge, NJ : Noyes Publications .
  • Chen , F. A. 1965 . Plasma Diagnostic Techniques , New York : Academic Press .
  • Cui , C. and Goree , J. 1994 . Fluctuations of the Charge on a Dust Grain in a Plasma . IEEE Trans. Plasma Sci. , 22 : 3813 – 3819 .
  • Forsyth , B. R. , Liu , B. Y. H. and Romay , F. J. 1998 . Charge Distribution Measurement of Commonly Generated Laboratory Aerosols . Aerosol Sci. Technol. , 28 : 489 – 501 .
  • Fridman , A. A. , Boufendi , L. , Hbid , T. , Potapkin , B. V. and Bouchoule , A. 1996 . Dusty Plasma Formation: Physics and Critical Phenomena. Theoretical Approach . J. Appl. Phys. , 79 (3) : 1303 – 1314 .
  • Goree , J. 1994 . Charging of Particles in a Plasma . Plasma Sources Sci. Technol. , 3 : 400 – 406 .
  • Hoppel , W. A. and Frick , G. M. 1986 . Ion-Aerosol Attachment Coefficients and the Steady State Charge Distribution on Aerosols in a Bipolar Ion Environment . Aerosol Sci. Technol. , 5 : 1 – 21 .
  • Kushner , M. J. 1987 . A Model for the Discharge Kinetics and Plasma Chemistry During Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon . J. Appl. Phys. , 63 : 2532 – 2551 .
  • Laing , E. W. 1976 . Plasma Physics , London : Sussex University Press .
  • Liu , B. Y. H. and Pui , D. Y. H. 1974 . Electrical Neutralization of Aerosols . Aerosol Sci. Technol. , 5 : 465 – 472 .
  • Masi , M. , Besana , G. , Canzi , L. and Carra , S. 1994 . Modeling of Silicon Nitride Deposition by Rf Plasma-Enhanced Chemical Vapor Deposition . Chem. Eng. Sci. , 49 : 669 – 679 .
  • Matsoukas , T. 1997 . The Coagulation Rate of Charged Aerosols in Ionized Gases . J Colloid Interface Sci. , 187 : 474 – 483 .
  • Matsoukas , T and Russell , M. 1995 . Particle Charging in Low-Pressure Plasmas . J. Appl. Phys. , 77 : 4285 – 4292 .
  • McCaughey , M. J. and Kushner , M. J. 1989 . Electron Transport Coefficients in Dusty Argon Plasmas . Appl. Phys. Lett. , 55 : 951 – 953 .
  • Nowlin , R. N. and Carlile , R. N. 1991 . The Electrostatic Nature of Contaminative Particles in a Semiconductor Processing Plasma . J. Vac. Sci. Technol , A9 : 2825 – 2833 .
  • Sehweigert , V. A. and Schweigert , I. V. 1996 . Coagulation in a LowTemperature Plasma . J. Phys. D: Appl. Phys. , 29 : 655 – 659 .
  • Walch , B. , Horanyi , M. and Robertson , S. 1994 . Measurement of the Charging of Individual Dust Grains in a Plasma . IEEE Trans. Plasma Sci. , 22 : 97 – 102 .
  • Watanabe , Y , Shiratani , M. , Kubo , I. , Ogawa , I. and Ogi , S. 1988 . Effects of Low-Frequency Modulation on Rf Discharge Chemical Vapor Deposition . Appl. Phys. Lett. , 53 : 1963 – 1965 .
  • Watanabe , Y and Shiratani , M. 1993 . Growth Kinetics and Behavior of Dust Particles in Silane Plasmas . Jpn. J. Appl. Phys. , 32 : 3074 – 3080 .
  • Watanabe , Y , Shiratani , M. , Fukuzawa , T. and Kawasaki , H. 1994 . Effects of Particles on He-SiH4 Modulated Rf Discharges . Plasma Sources Sci. Technol. , 3 : 355 – 358 .
  • Wu , J. J. and Miller , R. J. 1989 . Measurements of Charge on Submicron Particles Generated in a Sputtering Process . J. Appl. Phys. , 67 : 1051 – 1054 .

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