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IETE Journal of Research Volume 26, 1980 - Issue 3

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Letters to the Editor

Application of Photolithography to Development of Photocathodes for Electron Optical Imaging Devices

Sunita Singh Optoelectronic Section, Bhabha Atomic Research Centre, Trombay, Bombay 400 085.

L.M. Rangarajan Optoelectronic Section, Bhabha Atomic Research Centre, Trombay, Bombay 400 085.

T.U. PishoradySolid State Electronics Group, Tata Institute of Fundamental Research, Bombay400 005.

Pages 190-191 | Received 06 Feb 1979, Published online: 11 Jul 2015

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https://doi.org/10.1080/03772063.1980.11452074

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REFERENCES

Maissel (L I) & Glang (R). Handbook of Thin-Film Technology. 1970. McGraw-Hill Book Company, London. P 7-1 to 7-66.
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Special Issue on Pattern Generation and Microlithography. IEEE Trans. ED-22, 7; 1975; 369–498.
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Rangarajan (L M), Singh (S), Katti (V R) & Ghatpande (MG). The Improved Version of an Electron Optical Demountable System to Study the Image Tube Designs. J. of Physics E: Scientific Instruments. 12, 1979; 845–848.
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O'Keefee (T W), Vine (J) & Handy (RM). An Electron Imaging System for the Fabrication of Integrated Circuits. Solid-State Electronics. 12, 1969; Pergamon Press (Oxford). P 841–848.
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