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Letters to the Editor

Metallization System for Shallow-Junction Silicon Photodiodes

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Pages 193-195 | Received 01 Oct 1980, Published online: 11 Jul 2015

REFERENCES

  • Schnable (G L) & Keen (R S). Aluminium Metallization- Advantages and Limitations For Integrated Circuit Applications. Proc. IEEE. 57, 9; 1966; 1570–1580.
  • Rosenberg (R). Inhibition of Electromigration Damage in Thin Films. J. Vac. Sci. & Technol. 9, 1; 1977; 263–270.
  • Basterfield (J), Shannon (J M) & Gill (A). The Nature of Barrier Height Variations in Alloyed Al-Si Schottky Barrier Diodes. Solid-State Electronics. 18, 3; 1977; 290–291.
  • Thomas (R E) & Hass (G A). Diffusion Measurements In Thin Films Utilizing Work Function Changes; Cr into Au. J. Appl. Phys. 43, 12; 1977; 4900–4907.
  • Hirvonen (J K), Weisenberger (W H), Westmoreland (J E) & Meussner (R A). Backscattering Investigation of Low Temperature Migration of Chromium through Gold Films. Appl. Phys. Lett. 21, 1; 1977; 37–39.
  • Lau (S S). The Use of Sputtered Conductor Materials in Film Integrated Circuits. Thin-Solid Films. 14, 1; 1977; 87–103.
  • Lepselter (M P). Beam-Lead Technology. Bell. Syst. Tech. J. 45, 2; 1966; 233–254.
  • Stern (M) & Wissenberg (H). The Influence of Noble Metal Alloy Additions On the Electrochemical Behaviour of Titanium. J. Electrochem. Soc. 106,9; 1955; 759–764.
  • Buck (R III), Sloope (B W) & Leidheiser (H Jr.). Effects of Foreign Metals On Corrosion of Titanium in Boiling 2M Hydrochloric Acid. Corrosion. 15, 11; 1955; 566t–570t.
  • Holloway (P H). Gold/Chromium Metallization for Electronic Devices. Solid-State Technol. 23, 2; 1988; 109–115.
  • Tisone (T C) & Drobek (J). Diffusion in Thin Films Ti-Au, Ti-Pd and Ti-Pt Couples. J. Vac. Sci & Technol. 9, 1; 1977; 271–275.
  • Mattox (D M). Thin-Film Metallization of Oxides in Microelectronics. Thin-Solid Films. 18, 2; 1977; 173–186.
  • Hall (P M), Morabito (J M) & Poate (J M). Diffusion Mechanisms in the Pd/Au Thin-Film System and The Correlation of Resistivity Changes with Auger Electron Spectroscopy and Rutherford Backscattering Profiles. Thin-Solid Films. 33, 1; 1977; 107–134.
  • Boyko (B T), Palatnik (L S) & Lebedeva (M V). Electron Diffraction Analysis of Diffusion in Thin Gold-Palladium Films. The Physics of Metals & Metallography. 25, 5; 1966; 88–91.
  • Boyko (B T) & Lebedeva (M V). Changes in the Boundary Structure of Duplex Films of Gold and Palladium as a Result of Diffusion Annealing. The Physics of Metals and Metallography. 29, 3; 1977; 159–164.

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