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Letters to the Editor

Non-Ideal Behaviour of SiO2 Passivated Ni-(n)GaAs Schottky Barrier Diodes

, , , , , & show all
Pages 610-611 | Received 05 Dec 1981, Published online: 10 Jul 2015

REFERENCES

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  • Sato (Y), Uchida (M), Shimada (K), Ida (M)&Imai (T). GaAs Schottky Barrier Diode. Rev. Elect. Comm. Lab, Japan. 18, 1970; 9–10; 638–644.
  • Sharma (B L), Bharti (P L), Mukerjee (S N) & Mohan (S). Low Temperature Deposition of Si02 Films on GaAs Using Tetraethoxysilane. J. Inst. Electron d. Telecomm. Engs. 23, 12; 1977; 727–728.
  • Sharma (B L), Bharti (P L), Mukherjee (S N) & Mohan (S). Effect of Alloying Time on the Ohmic Contact Behaviour of Au/Au-Ge/GaAs (n) Structure. Ind. J. of Pure & Appl. Phys. 16, 8; 1978; 727–730.
  • Vasudev (P K), Mattes (B L), Pietras (E) & Bube (R H). Excess Capacitance and Non-ideal Schottky Barrier on GaAs. Solid-State Electronics. 19. 7; 1976; 557–559.

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